Nonvolatile semiconductor memory device and method of manufacturing the same

ABSTRACT

This nonvolatile semiconductor memory device includes: a memory cell array including a memory cell; a wiring part connecting the memory cell array to an external circuit; and a transistor that connects the wiring part and the external circuit, the transistor including: a first insulating layer including a first region, a second region, and a third region, the second and third regions being disposed on both sides of the first region, and a height of an upper surface of the first region being lower than those of the second region and the third region; a semiconductor layer disposed along upper surfaces of the first region, the second region, and the third region; and a gate electrode layer disposed via the semiconductor layer and a gate insulating film, on an upper part of the second region.

CROSS REFERENCE TO RELATED APPLICATIONS

This application is based on and claims the benefit of priority fromprior Japanese Patent Application No. 2016-054724, filed on Mar. 18,2016, the entire contents of which are incorporated herein by reference.

BACKGROUND

Field

Embodiments described below relate to a nonvolatile semiconductor memorydevice.

Description of the Related Art

In recent years, a three-dimensional type nonvolatile semiconductormemory device has been gathering attention as a nonvolatilesemiconductor memory device for achieving raising of integration level,without being confined to a limit of resolution of lithographytechnology.

Such a three-dimensional type nonvolatile semiconductor memory deviceincludes a wiring part for connection to an external peripheral circuit.The wiring part is connected to the external peripheral circuit via thelikes of a contact plug and upper layer wiring, via a switch transistor.

However, along with an increase in memory capacity, the number of switchtransistors has ended up increasing, and this is a factor that hindersraising of the integration level.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a block diagram showing a schematic configuration of a NANDtype flash memory according to a first embodiment.

FIG. 2 is a perspective view showing a schematic configuration of amemory cell array MA and a stepped wiring part SR.

FIG. 3 is a circuit diagram describing a circuit configuration of thememory cell array MA.

FIG. 4 is a schematic perspective view of the memory cell array MA.

FIG. 5 is a cross-sectional view of the memory cell array MA and thestepped wiring part SR.

FIG. 6 is a cross-sectional view showing details of a structure of amemory transistor layer 30.

FIG. 7 is a perspective view showing a structure of a transistor SWTrincluded in a word line connection circuit SW formed in an upper part ofthe stepped wiring part SR, of the first embodiment.

FIG. 8 is a cross-sectional view of the transistor SWTr formed in theupper part of the stepped wiring part SR.

FIGS. 9A to 9H show a method of manufacturing the transistor SWTraccording to the first embodiment.

FIG. 10 shows a modified example of the transistor SWTr according to thefirst embodiment.

FIG. 11 shows a modified example of the transistor SWTr according to thefirst embodiment.

FIG. 12 is a cross-sectional view showing a structure of a transistorSWTr according to a second embodiment.

FIGS. 13A to 13F show a method of manufacturing the transistor SWTraccording to the second embodiment.

FIG. 14 shows a modified example of the transistor SWTr according to thesecond embodiment.

DETAILED DESCRIPTION

A nonvolatile semiconductor memory device according to an embodimentincludes: a memory cell array including a memory cell; a wiring partconnecting the memory cell array to an external circuit; and atransistor that connects the wiring part and the external circuit, thetransistor including: a first insulating layer including a first region,a second region, and a third region, the second and third regions beingdisposed on both sides of the first region, and a height of an uppersurface of the first region being lower than those of the second regionand the third region; a semiconductor layer disposed along uppersurfaces of the first region, the second region, and the third region;and a gate electrode layer disposed via the semiconductor layer and agate insulating film, on an upper part of the second region.

Next, nonvolatile semiconductor memory devices according to embodimentswill be described in detail with reference to the drawings.

First Embodiment

First, a NAND type flash memory according to a first embodiment will bedescribed with reference to FIG. 1. As shown in FIG. 1, this NAND typeflash memory of the first embodiment includes a memory cell array MA.

In addition, this NAND type flash memory includes a row decoder RD, aword line connection circuit SW, a bit line connection circuit BLHU, asense amplifier circuit S/A, and a peripheral circuit PERI, in aperiphery of the memory cell array MA.

As will be described later, the memory cell array MA has memory cellsarranged three-dimensionally therein. Moreover, this memory cell arrayMA includes: a plurality of word lines WL that extend longitudinally inan X direction of FIG. 1; and a plurality of bit lines BL and a sourceline SL that extend longitudinally in a Y direction of FIG. 1. Theplurality of word lines WL are stacked in a stacking direction (Zdirection) in the memory cell array MA. The plurality of word lines WLare each connected to different memory cells MC arranged in the stackingdirection in the memory cell array MA.

In addition, a stepped wiring part SR for connecting the word line WLand an external circuit is formed in the periphery of this memory cellarray MA. As shown in FIG. 2, this stepped wiring part SR includes alead-out wiring connected to an identical layer to a conductive layer 31acting as the word line WL, and this lead-out wiring is formed in astepped shape. The stepped wiring part SR is formed by etching stackedconductive layers 31 and inter-layer insulating films 32 whileperforming slimming processing isotropically on a resist, by awell-known method. Therefore, as shown in FIGS. 1 and 2, the steppedwiring part SR is usually formed so as to surround all sides of thememory cell array MA.

The row decoder RD selects the plurality of word lines WL and supplies avoltage required in an operation. Moreover, the word line connectioncircuit SW is a switching circuit for connecting the word line WL andthe row decoder RD, and includes many transistors SWTr that connect theword line WL and the row decoder RD. As will be described later, thetransistor SWTr configuring this word line connection circuit SW isdisposed so as to be superposed on the stepped wiring part SR in an XYplane, upwardly of the stepped wiring part SR.

Furthermore, the sense amplifier circuit S/A and the bit line connectioncircuit BLHU are disposed in the Y direction of the stepped wiring partSR. The sense amplifier circuit S/A is connected to the bit line BL viathe bit line connection circuit BLHU, and functions to provide the bitline BL with a voltage for write and to detect and amplify a potentialappearing in the bit line BL during read. The bit line connectioncircuit BLHU includes a transistor that controls connection of the bitline BL and the sense amplifier circuit S/A. The peripheral circuit PERIincludes a circuit other than the above-described, for example, a powersupply circuit, a charge pump circuit (booster circuit), a dataregister, and so on.

Next, a circuit configuration of the memory cell array MA will bedescribed. FIG. 3 is a circuit diagram of the memory cell array MA. Notethat this structure of the memory cell array MA shown in FIG. 3 ismerely an example. It goes without saying that a later-describedstructure of the word line connection circuit SW may be applied also toa variety of three-dimensional type memory cell arrays other than thatshown.

As shown in FIG. 3, the memory cell array MA includes a plurality ofmemory blocks MB. The memory blocks MB are arranged in the Y directionon a semiconductor substrate Ba (not shown).

The memory block MB includes a plurality of memory strings MS, a sourceside select transistor SSTr, and a drain side select transistor SDTr.The memory string MS is configured by memory transistors (memory cells)MTr1-MTr4 connected in series. To simplify description, the exampleshown describes the case where one memory string MS includes four memorytransistors MTr, but it goes without saying that the present embodimentis not limited to this, and one memory string MS may include more memorytransistors.

The drain side select transistor SDTr is connected to one end of thememory string MS (the memory transistor MTr4). The source side selecttransistor SSTr is connected to the other end of the memory string MS(the memory transistor MTr1). For example, the memory strings MS areprovided in a matrix in the XY plane over a plurality of rows and aplurality of columns, in each one of the memory blocks MB.

In the memory block MB, control gates of the memory transistors MTr1arranged in a matrix are commonly connected to a word line WL1.Similarly, control gates of the memory transistors MTr2 are commonlyconnected to a word line WL2. Control gates of the memory transistorsMTr3 are commonly connected to a word line WL3. Control gates of thememory transistors MTr4 are commonly connected to a word line WL4.

Moreover, in the memory block MB, control gates of each of the drainside select transistors SDTr arranged in a line in the X direction arecommonly connected to a drain side select gate line SGD. A plurality ofthe drain side select gate lines SGD are provided at a certain pitch inthe Y direction in one memory block MB. Moreover, other ends of thedrain side select transistors SDTr arranged in a line in the Y directionare commonly connected to the bit line BL. The bit line BL is formed soas to extend in the Y direction straddling the memory block MB. Aplurality of the bit lines BL are provided in the X direction.

In one memory block MB, control gates of all of the source side selecttransistors SSTr are commonly connected to a source side select gateline SGS. Moreover, other ends of the source side select transistorsSSTr arranged in the Y direction are commonly connected to a source lineSL.

The above-described kind of circuit configuration of the memory cellarray MA is achieved by a stacked structure shown in FIGS. 4 and 5. FIG.4 is a schematic perspective view of the memory cell array MA. FIG. 5 isa cross-sectional view of the memory cell array MA and the steppedwiring part SR.

As shown in FIGS. 4 and 5, the memory cell array MA includes a sourceside select transistor layer 20, a memory transistor layer 30, a drainside select transistor layer 40, and a wiring layer 50 that are stackedsequentially on the semiconductor substrate Ba in each of the memoryblocks MB.

The source side select transistor layer 20 is a layer functioning as thesource side select transistor SSTr. The memory transistor layer 30 is alayer functioning as the memory string MS (memory transistorsMTr1-MTr4). The drain side select transistor layer 40 is a layerfunctioning as the drain side select transistor SDTr. The wiring layer50 is a layer functioning as various kinds of wirings.

As shown in FIGS. 4 and 5, the source side select transistor layer 20includes a source side first insulating layer 21, a source sideconductive layer 22, and a source side second insulating layer 23 thatare formed sequentially above the semiconductor substrate Ba. The sourceside conductive layer 22 is formed so as to extend two-dimensionally (ina plate-like shape) in the X direction and the Y direction, over thememory block MB.

The source side first insulating layer 21 and the source side secondinsulating layer 23 are configured by silicon oxide (SiO₂), for example.The source side conductive layer 22 is configured by polysilicon (p-Si),for example. Moreover, as shown in FIG. 5, the source side selecttransistor layer 20 includes a source side hole 24 formed so as topenetrate the source side first insulating layer 21, source sideconductive layer 22, and source side second insulating layer 23. Thesource side holes 24 are formed in a matrix in the X direction and the Ydirection.

Furthermore, as shown in FIG. 5, the source side select transistor layer20 includes a source side gate insulating layer 25 and a source sidecolumnar semiconductor layer 26 that are formed sequentially on asidewall facing the source side hole 24. The source side gate insulatinglayer 25 is formed with a certain thickness on the sidewall facing thesource side hole 24. The source side columnar semiconductor layer 26 isformed so as to fill the source side hole 24. The source side columnarsemiconductor layer 26 is formed in a column shape extending in thestacking direction. An upper surface of the source side columnarsemiconductor layer 26 is formed so as to contact a lower surface of alater-described columnar semiconductor layer 35. The source sidecolumnar semiconductor layer 26 is formed on a source diffusion layerBa1 on the semiconductor substrate Ba. The source diffusion layer Ba1functions as the source line SL.

The source side gate insulating layer 25 is configured by silicon oxide(SiO₂), for example. The source side columnar semiconductor layer 26 isconfigured by polysilicon (p-Si), for example.

In the above-described configuration of the source side selecttransistor layer 20, the source side conductive layer 22 functions asthe control gate of the source side select transistor SSTr and as thesource side select gate line SGS.

In addition, as shown in FIGS. 4 and 5, the memory transistor layer 30includes first through fourth word line conductive layers 31 a-31 d andfirst through fourth inter-word line insulating films 32 a-32 d that arestacked sequentially on the source side select transistor layer 20. Thefirst through fourth word line conductive layers 31 a-31 d and the firstthrough fourth inter-word line insulating films 32 a-32 d are formed soas to extend two-dimensionally (in a plate-like shape) in the Xdirection and the Y direction. The first through fourth word lineconductive layers 31 a-31 d and the first through fourth inter-word lineinsulating films 32 a-32 d are divided for each memory block MB.

Moreover, as shown in FIG. 5, the memory transistor layer 30 includes amemory hole 33 formed so as to penetrate the first through fourth wordline conductive layers 31 a-31 d and the first through fourth inter-wordline insulating films 32 a-32 d. The memory holes 33 are formed in amatrix in the X direction and the Y direction. The memory hole 33 isformed at a position aligned with the source side hole 24.

Furthermore, as shown in FIG. 6, the memory transistor layer 30 includesa block insulating layer 34 a, a charge accumulation layer 34 b, atunnel insulating layer 34 c, and the columnar semiconductor layer 35that are formed sequentially on a sidewall facing the memory hole 33.

As shown in FIG. 6, the block insulating layer 34 a is formed with acertain thickness on the sidewall facing the memory hole 33. The chargeaccumulation layer 34 b is formed with a certain thickness on a sidewallof the block insulating layer 34 a. The tunnel insulating layer 34 c isformed with a certain thickness on a sidewall of the charge accumulationlayer 34 b. The columnar semiconductor layer 35 is formed so as to fillthe memory hole 33. The columnar semiconductor layer 35 is formed in acolumn shape so as to extend in the stacking direction. The lowersurface of the columnar semiconductor layer 35 is formed so as tocontact the upper surface of the source side columnar semiconductorlayer 26. Moreover, an upper surface of the columnar semiconductor layer35 is formed so as to contact a lower surface of a later-described drainside columnar semiconductor layer 44. Note that the columnarsemiconductor layer 35 may also be configured having an insulating filmcore at its center. Note that the block insulating layer 34 a and thetunnel insulating layer 34 c are configured by silicon oxide (SiO₂), forexample. The charge accumulation layer 34 b is configured by siliconnitride (SiN), for example. The columnar semiconductor layer 35 isconfigured by polysilicon (p-Si), for example.

In the above-described configuration of the memory transistor layer 30,the first through fourth word line conductive layers 31 a-31 d functionas the control gates of the memory transistors MTr1-MTr4 and as the wordlines WL1-WL4.

As shown in FIGS. 4 and 5, the drain side select transistor layer 40includes a drain side conductive layer 41 stacked on the memorytransistor layer 30. The drain side conductive layer 41 is formeddirectly above where the columnar semiconductor layer 35 is formed. Thedrain side conductive layers 41 extend having longitudinally the Xdirection, and are formed in stripes with a certain pitch in the Ydirection. The drain side conductive layer 41 is configured bypolysilicon (p-Si), for example.

Moreover, as shown in FIG. 5, the drain side select transistor layer 40includes a drain side hole 42 formed so as to penetrate the drain sideconductive layer 41. The drain side holes 42 are formed in a matrix inthe X direction and the Y direction. The drain side hole 42 is formed ata position aligned with the memory hole 33.

Furthermore, as shown in FIG. 5, the drain side select transistor layer40 includes a drain side gate insulating layer 43 and a drain sidecolumnar semiconductor layer 44 that are formed sequentially on asidewall facing the drain side hole 42. The drain side gate insulatinglayer 43 is formed with a certain thickness on the sidewall facing thedrain side hole 42. The drain side columnar semiconductor layer 44 isformed so as to fill the drain side hole 42. The drain side columnarsemiconductor layer 44 is formed in a column shape so as to extend inthe stacking direction. The lower surface of the drain side columnarsemiconductor layer 44 is formed so as to contact the upper surface ofthe columnar semiconductor layer 35. Note that the drain side gateinsulating layer 43 is configured by silicon oxide (SiO₂), for example.The drain side columnar semiconductor layer 44 is configured bypolysilicon (p-Si), for example. The drain side conductive layer 41functions as the control gate of the drain side select transistor SDTrand as the drain side select gate line SGD.

As shown in FIG. 5, the wiring layer 50 includes the likes of a firstwiring layer 51 in a region including the memory cell array MA, andincludes the likes of a channel semiconductor layer CR, a gateinsulating film GI, and a gate electrode layer GE in a region includingthe stepped wiring part SR.

The first wiring layer 51 is formed so as to contact an upper surface ofthe drain side columnar semiconductor layer 44. The first wiring layers51 are formed with a certain pitch in the X direction so as to extend inthe Y direction. The first wiring layer 51 functions as the bit line BL.

Moreover, the channel semiconductor layer CR, the gate insulating filmGI, and the gate electrode layer GE are members configuring thepreviously described transistor SWTr in the word line connection circuitSW. The channel semiconductor layer CR functions as a channel region ofthese transistors SWTr. As will be described later, the gate insulatingfilm GI is formed on a surface of the channel semiconductor layer CR,and the gate electrode layer GE is formed on the surface of the channelsemiconductor layer CR via this gate insulating film GI.

The channel semiconductor layer CR may be configured by, for example,polysilicon, monocrystalline silicon, TiO₂, or a semiconductor oxide(for example, InGaZnO, ZnO, InOx, and so on).

The gate insulating film GI is configured from a silicon oxide(SiO_(x)), for example. The gate insulating film GI, besides beingconfigured from a silicon oxide, may also be configured from at leastone of silicon nitride (SiN), silicon oxynitride (SiON), aluminum oxide(Al₂O₃), aluminum oxynitride (AlON), hafnia (HfO₂), hafnium aluminate(HfAlO₃), hafnium oxynitride (HfON), hafnium aluminate nitride (HfAlON),hafnium silicate (HfSiO), hafnium silicate nitride (HfSiON), lanthanumoxide (La₂O₃), and lanthanum aluminate (LaAlO₃).

The gate electrode layer GE may be formed from, for example, polysiliconor polysilicon to which an impurity has been added. The following may beincluded instead of polysilicon, namely a metal compound such astantalum nitride (TaN), tantalum carbide (TaC), and titanium nitride(TiN), or the following that show metallic electrical conductivitycharacteristics, namely Ni, V, Cr, Mn, Y, Mo, Ru, Rh, Hf, Ta, W, Ir, Co,Ti, Er, Pt, Pd, Zr, Gd, Dy, Ho, Er, and silicides of these.

As shown in FIG. 5, the stepped wiring part SR includes conductivelayers 31 a′-31 d′ formed by extending the first through fourth wordline conductive layers 31 a-31 d. That is, the conductive layers 31a′-31 d′ are formed in identical layers to, and are electrically andphysically connected to the first through fourth word line conductivelayers 31 a-31 d. The conductive layers 31 a′-31 d′ and first throughfourth inter-word line insulating films 32 a′-32 d′ sandwiched betweenthe conductive layers 31 a′-31 d′ are formed in a stepped shape suchthat positions of their ends in the X direction differ, and configure astepped part ST. The stepped part ST (ST1-ST4) in FIG. 5 configures partof the stepped wiring part SR of the kind shown in FIG. 2. The steppedpart ST shown specifically in FIG. 5 includes the stepped parts ST1-ST4formed by the conductive layers 31 a′-31 d′ and the first through fourthinter-word line insulating films 32 a′-32 d′ the positions of whose endsdiffer in the X direction.

A contact plug C1 having longitudinally the stacking direction (Zdirection) extends from each of these stepped parts ST1-ST4, so as topenetrate the first through fourth inter-word line insulating films 32a′-32 d′.

As shown in FIG. 5, an inter-layer insulating layer 60 is formed so asto fill a periphery of the source side select transistor layer 20, thememory transistor layer 30, and the drain side select transistor layer40.

A structure of the transistor SWTr according to the present embodimentwill be described with reference to FIGS. 7 and 8.

FIG. 7 is a perspective view showing the structure of the transistorSWTr included in the word line connection circuit SW formed in an upperpart of the stepped wiring part SR. FIG. 8 is a cross-sectional view ina YZ plane of the transistor SWTr formed in the upper part of thestepped wiring part SR. Note that to simplify illustration, FIG. 7 doesnot show the inter-layer insulating layer 60.

As shown in FIGS. 7 and 8, the transistor SWTr included in the word lineconnection circuit SW includes a base insulating layer BI (firstinsulating layer), the channel semiconductor layer CR (semiconductorlayer), the gate insulating film GI, the gate electrode layer GE, anembedded insulating layer EI (second insulating layer), and a diffusionlayer DL (impurity layer). These channel semiconductor layer CR, gateinsulating film GI, and gate electrode layer GE form a MOS structure,and configure a thin film transistor (TFT) structure in which a currentflowing between the diffusion layers DL is controlled by applying avoltage to the gate electrode layer GE.

As shown in FIG. 7, the channel semiconductor layer CR is formed along alongitudinal direction of the stepped parts ST1-ST4. In the case of sucha configuration, many channel semiconductor layers CR can be disposedalong a shape of the stepped part ST, and it becomes easy for moretransistors SWTr to be formed.

In the example shown in FIG. 7, the gate electrode layer GE of thisembodiment is commonly (continuously) connected over a plurality of thechannel semiconductor layers CR. As a result, one gate electrode layerGE (of plate-like shape) is connected to a plurality of the transistorsSWTr, and the number of upper layer wirings or contact plugs can bereduced. The gate electrode layer GE is not limited to such aconfiguration, and may be provided independently to each differenttransistor SWTr.

Moreover, as shown in FIGS. 7 and 8, an upper end of the contact plug C1is connected to one end (a back surface) of the channel semiconductorlayer CR where the diffusion layer DL is formed. On the other hand, acontact plug C2 separate from the contact plug C1 is connected to theother end (a front surface) of the channel semiconductor layer CR. Anupper layer wiring M1 (not shown) is connected to an upper end of thecontact plug C2. This upper layer wiring M1 is connected to the rowdecoder RD via another contact plug or wiring in an unshown region.

In the example shown in FIG. 8, the base insulating layer BI includestwo trenches T1 (concave parts), and the channel semiconductor layer CRis deposited so as to cover a surface of the base insulating layer BI. Atrench T2 is formed by an upper surface of the channel semiconductorlayer CR following the trench T1. The case where cross sections of thetrenches T1 and T2 are rectangular is shown, but another shape may alsobe adopted for the trenches T1 and T2. For example, the cross sectionsof the trenches T1 and T2 may be configured as the likes of a trapezoid,a triangle, a polygon, a semi-ellipse, or a semi-circle. Moreover, FIG.8 shows the case where the two trenches T1 have a similar shape, butthey may be configured such that their depths in the stacking directionor shapes are different.

By thus forming the trench T1 in the base insulating layer BI andforming the channel semiconductor layer CR on the surface of the baseinsulating layer BI so as to also follow the trench T1, a channel lengthof the transistor SWTr can be made larger than when the trench T1 is notformed. Note that the number or size and shape of the trenches T1 (firstregions) may be appropriately changed, and are of course not limited tothose shown.

As shown in FIG. 8, in a region (convex part) sandwiched by the twotrenches T1, the gate electrode layer GE is formed via the channelsemiconductor layer CR and the gate insulating film GI, above the baseinsulating layer BI. The trench T1 formed in the base insulating layerBI is embedded by the channel semiconductor layer CR and the embeddedinsulating layer EI formed on the channel semiconductor layer CR. Now, aregion where the trench T1 is formed, of the base insulating layer BI,is assumed to be a first region; a region where the gate electrode layerGE is formed, of the base insulating layer BI, is assumed to be a secondregion; and a region other than the first region and the second region,of the base insulating layer BI, is assumed to be a third region. Thatis, the trench T1 is formed by the first region having a height of itsupper surface configured lower than those of the second region and thethird region. In the example shown, the upper surface of the secondregion and the upper surface of the third region have the same height.As shown, the embedded insulating layer EI is planarized so as to attainthe same height as the upper surfaces of the channel semiconductor layerCR on the second region and the third region.

In the example shown in FIG. 8, the gate electrode layer GE is formed inan upper part of the second region sandwiched by inner sidewall surfacesof the two trenches T1, and the diffusion layer DL is formed in each ofthe third regions adjacent to outer sidewall surfaces of the twotrenches T1. In other words, the diffusion layer DL is formed at bothends of the channel semiconductor layer CR. In other words, thetransistor SWTr includes: a first insulating layer having on its surfacea concave part and a convex part adjacent to the concave part; asemiconductor layer disposed along the surface including the concavepart and the convex part of the first insulating layer; and a gateelectrode layer disposed via the semiconductor layer and a gateinsulating film, on the convex part. By adopting such a structure, thechannel length of the transistor SWTr can be made larger than when thetrench T1 is not formed. A method of manufacturing such a transistorstructure will be described later.

The diffusion layer DL is formed by an impurity being implanted in partof the channel semiconductor layer CR, and functions as a source/drainregion of the transistor SWTr. A region between the second region wherethe gate electrode layer GE is formed and the diffusion layer DL, of thechannel semiconductor layer CR, that is, the channel semiconductor layerCR along a sidewall surface and upper surface of the first region is notimplanted with an impurity, or is implanted with an impurity of aconcentration 10 times or more less compared to that of the diffusionlayer DL. This region is called an offset region of the diffusion layerDL. For example, a large offset region is required as a means forimproving withstand voltage when a high voltage is applied to the gateelectrode layer GE or drain.

As shown in FIG. 8, the transistor SWTr of the present embodiment isformed such that part of the offset region follows a bottom surface andsidewall surface of the trench T1 formed in the base insulating layerBI, and has a partly folded kind of shape. Forming in this way makes itpossible for a transistor SWTr provided with a large offset region to bemade small on a plane, hence a reduction of chip area can be achieved.Now, when an offset length in a plane indicated by d in FIG. 8 is small,respective potentials interfere with each other between the gateelectrode and diffusion layers, hence an offset effect ends upweakening. Therefore, it is desirable that an offset length d is to acertain extent large. Specifically, the offset length d is desirably 600nm or more.

Moreover, in the present embodiment, the trench T1 formed in the baseinsulating layer BI has an aspect ratio in cross section whose value isclose to 1.

Next, manufacturing steps of the transistor according to the firstembodiment will be described with reference to FIGS. 9A to 9H.

Upper portions of FIGS. 9A to 9E, FIG. 9F, and upper portions of FIGS.9G and 9H are cross-sectional views in the YZ plane; and lower portionsof FIGS. 9A to 9E, 9G, and 9H are arrow views of the XY plane as seenfrom above.

First, as shown in FIG. 9A, a base insulating layer BI′ which willbecome the base insulating layer BI is formed by depositing siliconoxide (SiO₂), for example. Next, as shown in FIG. 9B, the two trenchesT1 are formed in part of the base insulating layer BI′ by implementinganisotropic dry etching after patterning by photolithography, forexample, whereby the base insulating layer BI is formed. The baseinsulating layer BI may be formed by silicon nitride (SiN), for example,instead of silicon oxide.

Next, as shown in FIG. 9C, polysilicon, for example, is deposited so asto follow a surface of the base insulating layer BI including a bottomsurface and sidewall surface of the trench T1, and a channelsemiconductor layer CR′ which will become the channel semiconductorlayer CR is deposited. As a result, a trench T2′ which will become thetrench T2 in a later step, is formed.

Next, as shown in FIG. 9D, in order that the channel semiconductor layerCR′ on parts of the second region and the third region and part of thechannel semiconductor layer CR′ in the trench T1 are continuous, anotherpart of the channel semiconductor layer CR′ is removed by implementinganisotropic dry etching after patterning by photolithography, forexample, whereby the channel semiconductor layer CR′ undergoes divisionprocessing in the X direction. As a result, an upper surface of thechannel semiconductor layer CR′ divided in the trench T1 becomes thetrench T2. Moreover, division of the channel semiconductor layer CR′results in part of the trench T1 being exposed. At this time, thechannel semiconductor layer CR′, by undergoing division processing inthe X direction without being divided in the Y direction, attains ashape extending as a whole in the Y direction so as to follow surfacesof the second region and the third region and a bottom surface andsidewall surface of the trench T1. Note that channel semiconductorlayers CR and CR′ formed with a uniform thickness along the trench T1are described for reference, but the likes of shape, size or thicknessmay be arbitrarily changed.

Next, as shown in FIG. 9E, the embedded insulating layer EI (forexample, silicon oxide) is deposited on the trenches T1 and T2, andplanarization processing by CMP (Chemical Mechanical Polishing) isfurther implemented, whereby the trenches T1 and T2 are embedded. Theembedded insulating layer EI may be formed by silicon nitride instead ofsilicon oxide.

Next, as shown in FIG. 9F, for example, polysilicon and polysilicon towhich an impurity has been added are deposited in this order, and a gateinsulating film GI′ which will become the gate insulating film GI and agate electrode layer GE′ which will become the gate electrode layer GEare formed on surfaces of the embedded insulating layer EI and a convexpart of the channel semiconductor layer CR′.

Next, as shown in FIG. 9G, the gate electrode layer GE′ undergoesdivision processing in the X direction by implementing anisotropic dryetching after patterning by photolithography, for example. At this time,the gate insulating film GI′ need not be divided. Moreover, an end ofthe gate electrode GE is formed so as to overlap in the Z direction thechannel semiconductor layer CR′ formed along a sidewall surface on agate electrode layer GE side of the trench T1.

Next, as shown in FIG. 9H, an impurity is implanted in an entire surfaceof the base insulating layer BI by ion implantation, for example, andthe diffusion layer DL is formed at both ends of the channelsemiconductor layer CR, whereby the same structure as in FIG. 8 isformed. At this time, the gate electrode layer GE is formed so as tooverlap the channel semiconductor layer CR. That is, a length in the Xdirection of the gate electrode layer GE is formed so as to be largerthan a length in the X direction of the channel semiconductor layer CRon the second region. As a result, due to the gate electrode layer GE orthe embedded insulating layer EI, it is difficult for the impurity to beimplanted in, respectively, the second region directly below the gateelectrode layer GE or a region where the trench T1 has been embedded(first region). Therefore, the diffusion layer DL can be formed byself-alignment by a method implanting the entire surface withoutperforming patterning by photolithography, and a low cost can beachieved. Possible materials of the impurity of the diffusion layer DLand the offset region when implanted with the impurity at lowconcentration, are an impurity configuring an n type semiconductor, forexample, a pentavalent element such as arsenic (As) and phosphorus (P),an impurity configuring a p type semiconductor, for example, a trivalentelement such as boron (B) and indium (In), or a combination of thesematerials.

Modified examples of the transistor SWTr according to the firstembodiment are shown with reference to FIGS. 10 and 11. In the case ofFIG. 10, the gate electrode layer GE does not overlap the channelsemiconductor layer CR. Even in this case, a similar structure isobtained by performing patterning by photolithography, for example.

In the case of FIG. 11, only one trench T1 is formed in the baseinsulating layer BI. That is, the base insulating layer BI includes thefollowing in its B-B cross section, sequentially from the left side ofFIG. 11, namely: the third region where the diffusion layer DL isformed; the first region where the trench T1 is formed; the secondregion having the gate electrode layer GE formed in its upper part; andthe third region having the diffusion layer DL formed at its end. Evenin this case, the first region has a height of its upper surfaceconfigured lower than those of the second region and the third region.By making the trench T1 only on one side of the gate electrode layer GEin this way, it is also possible to make a different offset length andto form a transistor SWTr in which a current is easily led out only fromthe diffusion layer DL on one side configuring a short offset.

Second Embodiment

Next, a second embodiment will be described with reference to FIGS. 12to 14. An overall configuration of a nonvolatile semiconductor memorydevice according to the second embodiment is similar to that of thefirst embodiment (FIGS. 1 to 6), hence a detailed description thereofwill be omitted. In the second embodiment, the structure of thetransistor SWTr is different from in the first embodiment.

FIG. 12 is a cross-sectional view in the YZ plane of the transistor SWTraccording to the second embodiment. Similarly to in the firstembodiment, the transistor SWTr includes the base insulating layer BI(first insulating layer), the channel semiconductor layer CR(semiconductor layer), the gate insulating film GI, the gate electrodelayer GE, and the diffusion layer DL. In addition, part of the channelsemiconductor layer CR is formed so as to follow a bottom surface andsidewall surface of a trench T3 formed in the base insulating layer BI,and has a folded kind of shape. A trench T4 is formed by an uppersurface of the channel semiconductor layer CR along the trench T3. Thecase where cross sections of the trenches T3 and T4 are trapezoids isshown, but another shape may also be adopted for the trenches T3 and T4.The example shown shows the case where each of the trenches T3 and T4respectively all have similar shapes, but the present embodiment is notlimited to this, and each of the trenches T3 and T4 may also be givendifferent shapes. Moreover, the diffusion layer DL is formed at bothends of the channel semiconductor layer CR. Now, similarly to in thefirst embodiment, a region where the trench T3 is formed, of the baseinsulating layer BI, is assumed to be a first region; a region where thegate electrode layer GE is formed, of the base insulating layer BI, isassumed to be a second region; and a region other than the first regionand the second region, of the base insulating layer BI, is assumed to bea third region. Even in the second embodiment, the first region has aheight of its upper surface configured lower than those of the secondregion and the third region.

In the present embodiment, contrary to in the first embodiment, aplurality (in FIG. 12, three each on either side, a total of six) of thetrenches T3 are formed in a region between the second region where thegate electrode layer GE is formed and the diffusion layer DL. That is,the base insulating layer BI includes three first regions on both sidessandwiching the second region where the gate electrode GE is formed, andhas a structure in its B-B cross section that includes the following,sequentially from the left side of FIG. 12, namely: three eachalternately of the third regions and the first regions; the secondregion; and three each alternately of the first regions and the thirdregions. Moreover, contrary to in the first embodiment, aspect ratios incross section of each of the trenches T3 are formed so as to be largerthan 1. By thus forming a plurality of long-and-thin trenches T3respectively on both sides sandwiching the gate electrode layer GE, itis possible that while the offset length in the plane indicated by d inFIGS. 8 and 12 is maintained unchanged, an effective offset length isfurther increased. Moreover, the trench T3 formed in the base insulatinglayer BI is embedded simultaneously to when the gate insulating film GIis formed on the channel semiconductor layer CR. Details of thisembedding will be described in the following manufacturing steps.

Manufacturing steps of the transistor according to the second embodimentwill be described with reference to FIGS. 13A to 13F. Upper portions ofFIGS. 13A to 13F are cross-sectional views in the YZ plane; and lowerportions of FIGS. 13A to 13F are arrow views of the XY plane as seenfrom above.

First, as shown in FIG. 13A, the base insulating layer BI formed bydepositing silicon oxide (SiO₂) has the trench T3 formed therein, byperforming patterning by photolithography and then implementinganisotropic dry etching. At this time, contrary to in the case of FIG.9B, patterning is performed such that a plurality of the trenches T3 arerespectively formed on both sides of the region where the gate electrodelayer GE is formed (second region). At this time, contrary to in thefirst embodiment, aspect ratios of each of the trenches T3 are formed soas to be larger than 1. By forming the trench T3 in this way, even if alength of d indicated in FIG. 12 is about the same as in the case wherethere is one trench T3 (is about the same as a length of d indicated inFIG. 8), a plurality of longer-and-thinner trenches T3 are formed in thesame region, whereby the effective offset length can be furtherincreased. Note that the number and size of the trenches T3, andintervals between each of the trenches T3 are not limited to thoseshown, and may be appropriately changed.

Next, as shown in FIG. 13B, polysilicon, for example, is deposited so asto follow a surface of the base insulating layer BI including a bottomsurface and sidewall surface of the trench T3, whereby a channelsemiconductor layer CR′ is formed. At this time, by preventing theinside of the trench T3 from being completely filled, a trench T4′ whichwill become the trench T4 in a later step, can be formed.

Next, as shown in FIG. 13C, in order that the channel semiconductorlayer CR′ on parts of the second region and the third region and part ofthe channel semiconductor layer CR′ in the trench T3 are continuous,another part of the channel semiconductor layer CR′ is removed byimplementing anisotropic dry etching after patterning byphotolithography, whereby the channel semiconductor layer CR′ undergoesdivision processing in the X direction. As a result, an upper surface ofthe channel semiconductor layer CR′ divided in the trench T3 becomes thetrench T4. Moreover, division of the channel semiconductor layer CR′results in part of the trench T3 being exposed. At this time, thechannel semiconductor layer CR′, by undergoing division processing inthe X direction without being divided in the Y direction, attains ashape extending as a whole in the Y direction so as to follow uppersurfaces of the second region and the third region and a bottom surfaceand sidewall surface of the trench T3.

Next, the trenches T3 and T4 are embedded by an insulating layersimilarly to in FIG. 9, but in the present embodiment, as shown in FIG.13D, silicon oxide (SiO₂) which will become the gate insulating film GI′can be deposited on the channel semiconductor layer CR′ so as to embedthe trenches T3 and T4. By thus adjusting a width in the Y direction ofthe trench T3 in the step shown in FIG. 13A and a width in the Ydirection of the trench T3 in the step shown in FIG. 13C, embedding bythe embedded insulating layer EI and planarization processing can beomitted, and manufacturing costs can be lowered.

Specifically, in order for embedding by the embedded insulating layer EIto be omitted and for the trenches T3 and T4 to be embeddedsimultaneously to deposition of the gate insulating film GI′, it becomesa condition that, if a width in the Y direction of an opening of thetrench T3 is assumed to be a, a thickness of the channel semiconductorlayer CR in a direction perpendicular to a surface of the baseinsulating layer BI including the trench T3 is assumed to be b, adistance between an end in the X direction of the opening of the trenchT3 and an end in the X direction of that of the trench T4 shown in thelower portion of FIG. 13C is assumed to be c, and a thickness in thestacking direction of the gate insulating film GI shown in FIG. 13D isassumed to be e, then a≦2 (b+e) and c≦2e are satisfied. In the case thatthis condition cannot be satisfied, it is also possible for the trenchT3 to be embedded by the embedded insulating layer EI and forplanarization processing to be performed, similarly to in the firstembodiment. The example shown in FIG. 13D shows a state where the trenchT3 has been embedded simultaneously to deposition of the gate insulatingfilm GI.

Next, as shown in FIG. 13E, for example, polysilicon to which animpurity has been added is deposited on the gate insulating film GI′,and the gate electrode layer GE is formed.

Implementing anisotropic dry etching after patterning byphotolithography and performing division processing in the Y directionof the gate electrode layer GE′ and the gate insulating film GI′ resultsin a structure in which the channel semiconductor layer CR′, the gateinsulating film GI, and the gate electrode layer GE are disposed in thisorder on the second region. At this time, the gate insulating film GI′need not be divided. Moreover, the gate electrode layer GE is formed soas to overlap the channel semiconductor layer CR of a sidewall surfaceof the trench T4 adjacent to the second region. That is, a length in theX direction of the gate electrode layer GE is formed so as to be largerthan a length in the X direction of the channel semiconductor layer CRon the second region.

Next, as shown in FIG. 13F, after performing patterning in advance, animpurity is implanted in entire surfaces of the base insulating layer BIand the channel semiconductor layer CR′ by the likes of ionimplantation, and the diffusion layer DL is formed at both ends of thechannel semiconductor layer CR, whereby the same structure as in FIG. 12is formed. At this time, in a method where the impurity is implanted inentire surfaces, the impurity ends up being implanted also in part ofthe offset region, hence the impurity must be implanted after patterninghas been performed in advance by photolithography, for example. Possiblematerials of the impurity are an impurity configuring an n typesemiconductor, for example, a pentavalent element such as arsenic (As)and phosphorus (P), an impurity configuring a p type semiconductor, forexample, a trivalent element such as boron (B) and indium (In), or acombination of these materials.

FIG. 14 is a cross-sectional view showing a modified example of thetransistor SWTr according to the second embodiment. In this example, aplurality of the trenches T3 are respectively formed on both sidessandwiching the gate electrode layer GE, but the number of trenches T3formed on both sides is different on the left and on the right. Bychanging the number of trenches T3 in this way, it is also possible tomake a different offset length and, similarly to in the modified exampleshown in FIG. 11, to form a transistor SWTr in which a current is easilyled out only from the diffusion layer DL on one side configuring a shortoffset.

As described above, even in the second embodiment, part of the channelsemiconductor layer CR is formed so as to follow bottom surfaces andsidewall surfaces of the plurality of trenches T3 formed in the baseinsulating layer BI, and has a partly folded kind of shape. Forming inthis way makes it possible for a transistor SWTr provided with a largeoffset region to be made small on a plane, and makes it possible tosuppress an increase in area occupied by the word line connectioncircuit SW and reduce chip area as a whole.

While certain embodiments have been described, these embodiments havebeen presented by way of example only, and are not intended to limit thescope of the inventions. Indeed, the novel methods and systems describedherein may be embodied in a variety of other forms; furthermore, variousomissions, substitutions and changes in the form of the methods andsystems described herein may be made without departing from the spiritof the inventions. The accompanying claims and their equivalents areintended to cover such forms or modifications as would fall within thescope and spirit of the inventions.

For example, in the above-described embodiments, the memory string ofthe NAND type flash memory adopts the semiconductor layer 35 extendinglinearly in the stacking direction. However, it is also possible toadopt a configuration of the kind where the offset region of the channelsemiconductor layer CR of the transistor SWTr is folded, like that ofthe above-described embodiments, in a NAND type flash memory that has astructure in which the semiconductor layer 35 is instead folded back ina U shape, for example. Moreover, the configurations of theabove-described embodiments are not limited to a three-dimensional typeNAND type flash memory, and may also be applied to anotherthree-dimensional memory, for example, a resistance varying memory, andso on. That is, the configurations of the above-described embodimentsmay be applied to various forms of three-dimensionally disposedmemories.

What is claimed is:
 1. A nonvolatile semiconductor memory device,comprising: a memory cell array including a memory cell; a wiring partconnecting the memory cell array to an external circuit; and atransistor that connects the wiring part and the external circuit, thetransistor comprising: a first insulating layer including a firstregion, a second region, and a third region, the second and thirdregions being disposed on both sides of the first region, and a heightof an upper surface of the first region being lower than those of thesecond region and the third region; a semiconductor layer disposed alongupper surfaces of the first region, the second region, and the thirdregion; and a gate electrode layer disposed via the semiconductor layerand a gate insulating film, on an upper part of the second region. 2.The memory device according to claim 1, further comprising a secondinsulating layer disposed on the first region via the semiconductorlayer.
 3. The memory device according to claim 1, wherein the firstinsulating layer includes a plurality of the first regions whose uppersurfaces are in a lower position than that of the second region is, onat least one side of the second region, and the third region is disposedbetween a plurality of the first regions.
 4. The memory device accordingto claim 2, wherein the first insulating layer includes a plurality ofthe first regions whose upper surfaces are in a lower position than thatof the second region is, on at least one side of the second region, andthe third region is disposed between a plurality of the first regions.5. The memory device according to claim 1, wherein the first insulatinglayer includes a plurality of the first regions whose upper surfaces arein a lower position than that of the second region is, on each of bothsides of the second region, and the third region is disposed between aplurality of the first regions.
 6. The memory device according to claim2, wherein the first insulating layer includes a plurality of the firstregions whose upper surfaces are in a lower position than that of thesecond region is, on each of both sides of the second region, and thethird region is disposed between a plurality of the first regions. 7.The memory device according to claim 3, wherein a plurality of the firstregions have an aspect ratio of a sidewall surface and the upper surfacewhich is larger than
 1. 8. The memory device according to claim 5,wherein a plurality of the first regions have an aspect ratio of asidewall surface and the upper surface which is larger than
 1. 9. Thememory device according to claim 1, wherein a length of the gateelectrode layer in a first direction from the second region to the thirdregion along the upper surface of the second region is larger than alength in the first direction of the semiconductor layer on the secondregion.
 10. The memory device according to claim 2, wherein a length ofthe gate electrode layer in a first direction from the second region tothe third region along the upper surface of the second region is largerthan a length in the first direction of the semiconductor layer on thesecond region.
 11. The memory device according to claim 3, wherein alength of the gate electrode layer in a first direction from the secondregion to the third region along the upper surface of the second regionis larger than a length in the first direction of the semiconductorlayer on the second region.
 12. The memory device according to claim 1,wherein the semiconductor layer comprises an impurity layer at both endsof the semiconductor layer.
 13. The memory device according to claim 2,wherein the semiconductor layer comprises an impurity layer at both endsof the semiconductor layer.
 14. The memory device according to claim 3,wherein the semiconductor layer comprises an impurity layer at both endsof the semiconductor layer.
 15. The memory device according to claim 12,wherein the semiconductor layer has an impurity concentration betweenthe impurity layers which is 10 times or more less than that of theimpurity layer.
 16. A method of manufacturing a nonvolatilesemiconductor memory device, comprising: forming a first insulatinglayer; removing part of the first insulating layer to a certain depthfrom an upper surface of the first insulating layer to define a firstregion; forming a semiconductor layer along a surface of the firstinsulating layer; embedding a second insulating layer above an upperpart of the first region where the semiconductor layer has been formed;forming a gate insulating film above the semiconductor layer, and thenforming a gate electrode layer above the gate insulating film; andintroducing an impurity to form an impurity layer in part of thesemiconductor layer.
 17. A method of manufacturing a nonvolatilesemiconductor memory device, comprising: forming a first insulatinglayer; removing part of the first insulating layer to a certain depthfrom an upper surface of the first insulating layer to define a firstregion; forming a semiconductor layer along follow a surface of thefirst insulating layer including the first region; forming a gateinsulating film above an upper surface of the semiconductor layer andforming the gate insulating film above an upper part of the firstregion; forming a gate electrode layer above the gate insulating film ina second region different from the first region; and introducing animpurity to form an impurity layer in part of the semiconductor layer.18. The method according to claim 16, wherein the first region has anaspect ratio of a sidewall surface and the upper surface which is largerthan
 1. 19. The method according to claim 17, wherein the first regionhas an aspect ratio of a sidewall surface and the upper surface which islarger than 1.